Gert Leusink

Tokyo Electron - Tokyo / Japan

Engineering & Technology / Metallurgical & Materials Engineering

AD Scientific Index ID: 4969867

東京エレクトロン

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Gert Leusink's MOST POPULAR ARTICLES

1-) Structures and techniques for atomic layer deposition US Patent 8,722,548, 2014

2-) Method for forming a passivated metal layer US Patent 7,189,431, 2007

3-) Use of TiCl4 etchback process during integrated CVD-Ti/TiN wafer processing US Patent 5,926,737, 1999

4-) Complete band offset characterization of the HfO2/SiO2/Si stack using charge corrected x-ray photoelectron spectroscopy Journal of Applied Physics 107 (4), 2010

5-) Comparison of methods to determine bandgaps of ultrathin HfO2 films using spectroscopic ellipsometry Journal of Vacuum Science & Technology A 29 (4), 2011

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