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Ken Collins
Applied Materials, Inc. - Santa Clara / United States
Engineering & Technology / Electrical & Electronic Engineering
AD Scientific Index ID: 4401408
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Applied Materials, Inc.
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Ken Collins's MOST POPULAR ARTICLES
1-)
Inductively coupled pulsed plasmas in the presence of synchronous pulsed substrate bias for robust, reliable, and fine conductor etching IEEE Transactions on Plasma Science 37 (9), 1730-1746, 2009
2-)
Self-consistent simulation of very high frequency capacitively coupled plasmas Plasma Sources Science and Technology 17 (3), 035003, 2008
3-)
Effect of simultaneous source and bias pulsing in inductively coupled plasma etching Journal of Applied Physics 106 (10), 2009
4-)
Self-consistent electrodynamics of large-area high-frequency capacitive plasma discharge Journal of Applied Physics 108 (7), 2010
5-)
Control of plasma uniformity in a capacitive discharge using two very high frequency power sources Journal of Applied Physics 106 (3), 2009
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