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Naim Moumen

Naim Moumen

University of Texas Dallas - Richardson / United States
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AD Scientific Index ID: 1677462
The University of Texas at Dallas
person_outline Naim Moumen's MOST POPULAR ARTICLES
1-) Particle adhesion and removal mechanisms in post-CMP cleaning processes IEEE transactions on semiconductor manufacturing 15 (4), 374-382, 2002
2-) Nucleation and growth study of atomic layer deposited HfO2 gate dielectrics resulting in improved scaling and electron mobility Journal of applied physics 99 (2), 2006
3-) In situ infrared spectroscopy of hafnium oxide growth on hydrogen-terminated silicon surfaces by atomic layer deposition Applied Physics Letters 87 (13), 2005
4-) A cost effective 32nm high-K/metal gate CMOS technology for low power applications with single-metal/gate-first process 2008 symposium on vlsi technology, 88-89, 2008
5-) A manufacturable dual channel (Si and SiGe) high-k metal gate CMOS technology with multiple oxides for high performance and low power applications 2011 International Electron Devices Meeting, 28.1. 1-28.1. 4, 2011