


Yeshayahu Ishi Talmon
AD
Scientific
Index 2023
Technion Israel Institute of Technology
Engineering & Technology / Chemical Engineering

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|
SCORES | RANKINGS | |||
---|---|---|---|---|---|
In Technion Israel Institute of Technology (787) | In Israel (7090) | In Asia (397864) | World (1345190) | ||
Total H Index | 83 | #10 | #86 Top 2% | #1170 | #13381 Top 2% |
Last 6 years H Index | 41 | #19 | #177 | #4983 | #33125 |
Last 6 years / Total H Index
|
0.494 | ||||
Total i10 Index | 287 | #9 | #67 Top 2% | #1785 | #11120 Top 2% |
Last 6 years i10 Index | 158 | #11 | #77 Top 2% | #3118 | #17837 Top 2% |
Last 6 years / Total i10 Index | 0.551 | ||||
Total Citation | 27989 | #16 | #128 Top 2% | #1652 | #18691 Top 2% |
Last 6 years Citation | 6908 | #37 | #242 | #5956 | #42546 |
Last 6 years / Total Citation | 0.247 | ||||
Engineering & Technology * |
#2 (315) * |
#17 Top 2% (1303) * |
#334 (59916) * |
#1755 (177281) * |
|
Chemical Engineering *
electron microscopy | cryo-TEM | cryo-SEM | complex liquids | soft matter | |
#1 ![]() (17) * |
#1 ![]() (46) * |
#21 (2719) * |
#87 (6727) * |
* Mar 28, 2023 According to Total H. BETA VERSION. Subject field ranking in world, region, country and university is beta version since subject field 'others' (742.998 scientists profile whose branch cannot be determined, not yet edited or determined) is excluded, so the ranking will change as the others fields are edited. Please note that.
Top % 2: Indicates that the scientist is among the World's and/or Country's Top 2% Scientists in the specified rank.
Use [email protected] to report an inappropriate profile, death, or other conditions that would require the deletion of the relevant profile.
Click for registration and adding information.
Top % 2: Indicates that the scientist is among the World's and/or Country's Top 2% Scientists in the specified rank.
Use [email protected] to report an inappropriate profile, death, or other conditions that would require the deletion of the relevant profile.
Click for registration and adding information.
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